Silicon Technologies: Ion Implantation and Thermal Treatment (ISTE) by Annie Baudrant
2011 | ISBN: 1848212313 | English | 368 pages | PDF | 17.65 MB
2011 | ISBN: 1848212313 | English | 368 pages | PDF | 17.65 MB
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.