"Lithography" ed. by Eva Li
ITEvaLi | 2018 | ISBN: 9829480097 9789829480095 | 84 pages | PDF | 16 MB
ITEvaLi | 2018 | ISBN: 9829480097 9789829480095 | 84 pages | PDF | 16 MB
This book provides a compelling overview of some of the recent advances in lithography. Topics discussed include large-area nanoimprint lithography, optical proximity correction (OPC), micro/nano patterning on polymers
The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate fields as diverse as photonics and biology. Today, greater flexibility and affordability are demanded from lithography more than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques.
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits.
Contents
Preface
1 Introductory Chapter: The Eminence of Lithography—New Horizons of Next-Generation Lithography
2 Large-Area Nanoimprint Lithography and Applications
3 Optical Proximity Correction (OPC) Under Immersion Lithography
4 Micro/Nano Patterning on Polymers Using Soft Lithography Technique
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