Principles of Plasma Discharges and Materials Processing by Michael A. Lieberman
Principles of Plasma Discharges and Materials Processing by Michael A. Lieberman
English | Oct 28, 1994 | ISBN: 0471005770 | 572 Pages | PDF | 21 MB
English | Oct 28, 1994 | ISBN: 0471005770 | 572 Pages | PDF | 21 MB
Timely, authoritative, pedagogically consistent— a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications—especially in the fabrication of integrated circuits.