"Ion Implantation: Research and Application" ed. by Ishaq Ahmad
ITexLi | 2017 | ISBN: 9535132385 9535132377 9789535132370 9789535132387 | 142 pages | PDF | 21 MB
ITexLi | 2017 | ISBN: 9535132385 9535132377 9789535132370 9789535132387 | 142 pages | PDF | 21 MB
In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics.
Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology.
The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.
Contents
Preface
1 Introductory Chapter: Introduction to Ion Implantation
2 Metal Ions Implantation‐Induced Effects in GaN Thin Films
3 MeV Electron Irradiation of Ion-Implanted Si-SiO2 Structures
4 Ion-Beam-Induced Defects in CMOS Technology: Methods of Study
5 Development of Optical Waveguides Through Multiple-Energy Ion Implantations
6 Surface Modification of Silicone Rubber by Ion Implantation to Improve Biocompatibility
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