This book includes selected conference proceedings of Conference on Processing and Characterization of Materials (CPCM-2020). The content of the book includes processing of and characterization of materials, sustainable energy materials, defense materials, functionally graded materials, and composites which has significant impact on cutting-edge applications. The book also includes surface engineering, computational methods and materials, waste utilization, and corrosion and environmental degradation of materials.

The introduction of GaAs/ AIGaAs double heterostructure lasers has opened the door to a new age in the application of compound semiconductor materials to microwave and optical technologies. A variety and combination of semiconductor materials have been investigated and applied to present commercial uses with these devices operating at wide frequencies and wavelengths. Semiconductor modulators are typical examples of this technical evolutions and hsve been developed for commercial use. Although these have a long history to date, we are not aware of any book that details this evolution. Consequently, we have written a book to provide a comprehensive account of semiconductor modulators with emphasis on historical details and experimantal reports. The objective is to provide an up-to-date understanding of semiconductor modulators. Particular attention has been paid to multiple quantum well (MQW) modulators operating at long wavelengths, taking into account the low losses and dispersion in silica fibers occuring at around 1.3 and 1.55 mm. At the present time, MQW structures have been investigated but these have not been sufficiently developed to provide characteristic features which would be instructive enough for readers. One problem is the almost daily publication of papers on semiconductor modulators. Not only do these papers provide additional data, but they often modify the interpretations of particular concepts. Almost all chapters refer to the large number of published papers that can be consulted for future study.

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

New laser technology has developed a new dye chemistry! Development of the gallium-arsenic semiconductor laser (diode laser) that emits laser light at 780-830 nm has made possible development of new opto-electronic systems including laser optical recording systems, thermal writing display systems, laser printing systems, and so on. Medical applications of lasers in photodynamic therapy for the treatment of cancer were also developed. In such systems, the infrared absorbing dyes OR dyes) are currently used as effective photoreceivers for diode lasers, and will become the key materials in high technology. At the present time the chemistry of IR dyes is the most important and interesting field in dye chemistry. Laser light can be highly monochromatic, very well collimated, coher­ ent, and, in some cases, extremely powerful. These characteristics make diode lasers a very cheap, convenient, and useful light source for a variety of applications in science and technology. For these purposes, however, IR dyes with special characteristics are required. To develop new IR dyes, it is most important to establish the correlation between the chemical structures of dyes and other characteristics of dyes, such as their absorption spectra. Molecular design of IR dyes predicting the Amax and Emax values by molecular orbital (MO) calculations is now possible even by using a personal computer, and many types of new IR dyes have been demonstrated. Also, new opto-electronic systems using IR dyes as photoreceivers have been reported recently.

This book is the collection of the contributions offered at the International Symposium on Electromagnetic Fields in Electrical Engineering, ISEF '87, held in Pavia, Italy, in September 1987. The Symposium was attended by specialists engaged in both theoretical and applied research in low-frequency electromagnetism. The charming atmosphere of Pavia and its ancient university provided a very effective environment to discuss the latest results in the field and, at the same time, to enjoy the company or colleagues and friends coming from over 15 countries. The contributions have been grouped into 7 chapters devoted to fundamental problems, computer programs, transformers, rotating electrical machines, mechanical and thermal effects, various applications and synthesis, respectively. Such a classification is merely to help the reader because a few papers could be put in several chapters. Over the past two decades electromagnetic field computations have received a big impulse by the large availability of digital computers with better and better performances in speed and capacity. Many various methods have been developed but not all of them appear convenient enough for practical engineering use. In fact, the technical and industrial challenges set some principal attributes and criteria for good computation methods. They should be relatively easy to use, fit into moderately sized computers, yield useful design data, maintain flexibility with m1n1mum cost in time and effort.

This book discusses fundamental studies involving the history, modelling, simulation, experimental work, and applications on high-entropy materials. Topics include data-driven and machine-learning approaches, additive-manufacturing techniques, computational and analytical methods, such as density functional theory and multifractal analysis, mechanical behavior, high-throughput methods, and irradiation effects. The types of high-entropy materials consist of alloys, oxides, and ceramics. The book then concludes with a discussion on potential future applications of these novel materials.

The book presents the select proceedings of the International Conference on Recent Advances in Design, Materials and Manufacturing (ICRADMM 2020). The topics covered include structural mechanics, kinematics and dynamics of machines, mechanical structures and stress analysis, noise and vibration analysis, fault detection and condition monitoring, optimization techniques, mechatronics & robotics, product design and development, tribology. The book also discusses various properties and performance attributes of modern-age design in mechanical engineering including their durability, workability, and carbon footprint. The book will be a valuable reference for researchers and professionals interested in sustainable development in mechanical engineering design and allied fields.